北京大学学报(自然科学版)

Ni增强Er在富硅氮化硅薄膜中的光致发光

孙凯,徐万劲,冉广照   

  1. 北京大学物理学院介观物理国家重点实验室, 北京100871;
  • 收稿日期:2009-05-21 出版日期:2010-01-20 发布日期:2010-01-20

Ni-Enhanced Photoluminescence of Er3 Dopedin Si-Rich Nitride

SUN Kai, XU Wanjin, RAN Guangzhao   

  1. State Key Lab for Mesoscopic Physics, School of Physics, Peking University, Beijing 100871;
  • Received:2009-05-21 Online:2010-01-20 Published:2010-01-20

摘要: 采用反应磁控溅射技术沉积了掺Er的富硅氮化硅(SRN∶Er)薄膜和SRN∶Er Ni 3 个周期的超晶格, 两种薄膜都在1100 ℃进行退火实验。SRN ∶Er薄膜的光致发光谱为一个峰位在665 ~750 nm 的发光带和一个峰位在1. 54μm 的发光带, 前者来源于SRN 薄膜中的纳米硅, 后者为Er3+ 的特征发射。SRN ∶Er Ni超晶格的光致发光谱上出现Er3+ 在520 ,550 和850 nm 附近的精细结构, 并且Er3 + 在1. 54μm 的发光有12倍的增强。光谱精细结构的出现证明Er3+ 的微观环境由于掺Ni而变得有序。与在SRN 中相比, 在这种有序环境中Er3 + 的光学活性有明显的增强。拉曼散射光谱测量证明在SRN ∶Er Ni超晶格中纳米硅的数目比在SRN ∶Er 薄膜中有一定的增加。因而,Er3+ 1. 54 μm 发光 12 倍的增强是Er3+本身光学活性的增强和纳米硅数目的增加共同作用的结果。

关键词: 富硅氮化硅, Er, Ni, 光致发光

Abstract: Er-doped Si-rich nitride ( SRN ∶Er) films and three-period superlattices of SRN ∶Er Ni were deposited by reactive magnetronsputtering technique and annealed at 1100 ℃. The photo luminescence spectra of SRN ∶Er films show two emission bands, one centered at 665~750 nm and another peaked at 1. 54μm, where the 665~750 nmone is due to Si nanocrystals in SRN and the 1. 54μmone is characteristic for Er3+. The photo luminescence spectra of the super lattices exhibit fine structures of 3 + Er light emission around 520, 550 and 850 nm and a 12-fold enhanced Er light emission at 1. 54 μm. The appearance of these fine structures indicates that the local environments around Er3 + become ordered and Er3+ is much more optically active in such ordered environments than in SRN ∶Er films. Raman-scattering spectra measurements demonstrate an increase in the number of Sinanocrystals. Therefore, the 12-fold enhancement at 1.54μmis a result of the enhancement in the Er3+ optical activation and the increase in the number of Si nanocrystals .

Key words: Si-rich nitride, Er, Ni, photoluminescence

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