半连续金属膜在中断蒸镀后的电阻弛豫研究

北京大学学报（自然科学版）

半连续金属膜在中断蒸镀后的电阻弛豫研究

吴军桥, 王志军, 吴克, 张金龙, 李传义, 尹道乐

北京大学物理学系，北京，100871

收稿日期:1996-07-08 出版日期:1997-05-20 发布日期:1997-05-20

Postdeposition Resistance Relaxation of Semicontinuous Metal Films

WU Junqiao, WANG Zhijun, WU Ke, ZHANG Jinlong, LI Chuanyi, YIN Daole

Department of Physics, Peking University, Beijing, 100871

Received:1996-07-08 Online:1997-05-20 Published:1997-05-20

摘要/Abstract

摘要： 在超高真空的环境中蒸镀半连续铌(Nb)膜和银(Ag)膜，中断蒸镀后，立即原位测量样品电阻在10min内随时间的变化(弛豫现象)。发现Nb膜和Ag膜分别表现出电阻升高和降低的不同行为，而且基底温度和膜厚对弛豫强度都有较大的影响。分析表明，这些现象是由膜表面金属原子运动引起的岛的吞并以及岛的边际形变引起的。

关键词: 半连续金属膜, 电阻弛豫, 金属岛的边际形变, 渗流

Abstract: Semicontinuous niobium and silver films were made in an ultra high vacuum(UHV) chamber and in situ DC resistance measurements were performed. Interrupting the deposition, the immediate aging phenomenon (relaxation) of the sample resistance was investigated in a time scale of about 10 minutes. Resistance increase and decrease were observed for niobium and silver samples respectively. The intensity of the relaxation is sensitive to substrate temperature and film thickness. The edge diffusion and coalescence of islands due to thermomigration of the metal atoms are probably responsible for the resistance relaxation.

Key words: semicontinuous metal film, resistance relaxation, edge diffusion, percolation

中图分类号:

吴军桥, 王志军, 吴克, 张金龙, 李传义, 尹道乐 . 半连续金属膜在中断蒸镀后的电阻弛豫研究[J]. 北京大学学报（自然科学版）.

WU Junqiao,WANG Zhijun,WU Ke,ZHANG Jinlong,LI Chuanyi,YIN Daole. Postdeposition Resistance Relaxation of Semicontinuous Metal Films[J]. Acta Scientiarum Naturalium Universitatis Pekinensis.

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https://xbna.pku.edu.cn/CN/Y1997/V33/I3/340

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