北京大学学报（自然科学版）

氮离子轰击改善胶体石墨薄膜平面场发射特性的研究

王玮玮,孙辉,于利刚,张耿民1   

  1. 北京大学信息科学技术学院电子学系,北京,100871; 1通讯作者,E_mail:zgmin@pku.edu.cn
  • 收稿日期:2006-04-27 出版日期:2007-05-20 发布日期:2007-05-20

Improving the Field Emission Properties of a Graphite Paste Film by Nitrogen Ion Bombardment

WANG Weiwei, SUN HuiYU, LigangZHANG, Gengmin   

  1. 1Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University, Beijing, 100871; 1Corresponding Author, E_mail:zgmin@pku.edu.cn
  • Received:2006-04-27 Online:2007-05-20 Published:2007-05-20

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摘要： 研究了氮离子(N+)轰击对石墨薄膜场发射特性的影响。片层石墨被N+轰击成较整齐排列的锥尖阵列,尖端密度～108cm-2。XPS谱证实有许多N原子注入薄膜,膜内存在大量sp2杂化轨道键。场发射测试表明,经过N+轰击,整个薄膜在场发射的均匀一致性方面有较明显的改善,场发射电流密度从0.3增大到1.65mA/cm2。

关键词: 氮离子(N+), 溅射轰击, 石墨, 场发射阵列

Abstract: The field emission properties of a graphite paste film were found to have been greatly improved by nitrogen ion bombardment. The bombardment transformed the graphite surface into an array of graphite cones with a ～108cm-2 tip density. XPS measurement showed that plenty of nitrogen had been injected into the graphite film and there existed a large number of sp2 bonds. Field emission test demonstrated that the distribution of the emission sites in the post, bombardment film was much more dense and uniform than that of the original one. The maximum current density of 1.65mA/cm2 was also achieved, which was much higher than that of the pre, treatment sample.

Key words: N, ion, bombardment, graphite, field emission array

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