北京大学学报（自然科学版）

混合物理化学气相沉积法制备Mg衬底MgB2薄膜

姚丹,庄承钢,张开成,余增强,冯庆荣1,王福仁   

  1. 北京大学物理学院，人工微结构与介观物理国家重点实验室，北京，100871；1通讯联系人，E-mail: qrfeng@pku.edu.cn
  • 收稿日期:2005-08-10 出版日期:2006-05-20 发布日期:2006-05-20

Growth of MgB2 Thin Film Fabricated on Mg Substrate by Hybrid Physical-Chemical Vapor Deposition

YAO Dan, ZHUANG Chenggang, ZHANG Kaicheng, YU Zengqiang, FENG Qingrong, WANG Furen   

  1. School of physics and State Key Laboratory of Artifical Microstructure and Mesoscopic Physics, Peking University, Beijing, 100871
  • Received:2005-08-10 Online:2006-05-20 Published:2006-05-20

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摘要： 用混合物理化学气相沉积（Hybrid physical-chemical vapor deposition 简称为 HPCVD）法在Mg衬底上原位制备出MgB2超导薄膜样品。超导起始转变温度Tc(onset)＝39.5K，SEM(Scanning Electron Microscopy)图显示晶型结构为六方形，晶粒生长较为致密。样品的X射线衍射分析表明，MgB2薄膜是多晶的，没有择优方向。晶粒大小约为400nm～1μm。结果表明HPCVD技术在Mg表面直接沉积MgB2薄膜是可行的，对Mg原料的节约和MgB2线材的制备具有一定优势。

关键词: MgB2薄膜, M-T曲线, X射线衍射图, SEM图, EDX成分分析

Abstract: Superconducting MgB2 thin films were fabricated on Mg substrate by using the hybrid physical-chemical vapor deposition (HPCVD) technique. The film has a Tc(onset)＝39.5K. The SEM images demonstrate that crystallite is compact. X-ray diffraction pattern indicates the film is polycrystalline with no preferring growing direction. The grain size is about 400nm-1.0μm. These results show that it is feasible to deposit MgB2 thin films directly on Mg by HPCVD technique. It is advantaged to fabricate MgB2 fibers directly on SiC carrier and MgB2 superconductive wires.

Key words: MgB2 thin films, M-T curve, X-ray diffraction patterns, SEM image, EDX

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