实验设计与模拟相结合用于IC优化设计的TCAD工具

北京大学学报（自然科学版）

实验设计与模拟相结合用于IC优化设计的TCAD工具

甘学温,杜刚,肖志广

北京大学微电子学研究所，北京，100871

收稿日期:2001-09-14 出版日期:2002-09-20 发布日期:2002-09-20

A TCAD Tool of DOE Combining with Simulation for IC Optimization Design

GAN Xuewen，DU Gang，XIAO Zhiguang

Institute of Microelectronics, Peking University, Beijing, 100871

Received:2001-09-14 Online:2002-09-20 Published:2002-09-20

摘要/Abstract

摘要： 鉴于PC机广泛普及和使用方便，在PC机上建立起实验设计与模拟相结合用于IC优化设计的TCAD工具。利用已有的工艺模拟软件SUPREM、器件模拟软件MINIMOS及电路模拟软件PSPICE，完成了响应表面拟合、SPICE模型参数提取及数据转换等程序，形成一个可以进行工艺、器件及电路分析和优化设计的TCAD工具，并用于研究实验设计方法在IC优化设计中的应用。

关键词: 实验设计, 响应表面, 优化设计, TCAD工具

Abstract: A TCAD tool of DOE(Design of Experiment) combining with simulations for IC optimization design was implemented on a PC, some simulation software such as SUPREM, MINIMOS and PSPICE were utilized. The programs for fitting response surface, extracting SPICE model parameters and converting data files were completed. The application of DOE on IC optimization design was studied using the TCAD tool.

Key words: DOE, response surface, optimization design, TCAD tool

中图分类号:

TN402

甘学温,杜刚,肖志广. 实验设计与模拟相结合用于IC优化设计的TCAD工具[J]. 北京大学学报（自然科学版）.

GAN Xuewen,DU Gang,XIAO Zhiguang. A TCAD Tool of DOE Combining with Simulation for IC Optimization Design[J]. Acta Scientiarum Naturalium Universitatis Pekinensis.

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https://xbna.pku.edu.cn/CN/Y2002/V38/I5/713