关键词: 内场助光电发射, Ag-O-Cs光电阴极, 真空沉积制备

Abstract: With the aid of baffle movement, a technique named masking pretreatment and the method of vacuum deposition have been used to fabricate the Ag-O-Cs photoemissive thin films with internal field-assisted structure for the first time. The internal field-assisted photoemission characteristics of Ag-O-Cs thin films show that the photoelectric sensitivity is increased when the internal electric field is applied to the thin films, which indicates that the electric field has been effectively provided to the thin films by the above-mentioned internal field-assisted structure. Such an enhanced photoemission is attributed to the variations in energy-band structure of Ag-O-Cs thin films, and which are considered to induce the lower-energy electrons to participate in the photoemission.

Key words: internal field-assisted photoemission, Ag-O-Cs photocathode, vacuum deposition fabrication