等离子体刻蚀中边缘离子轨迹的控制与优化
李国荣, 赵馗, 严利均, Hiroshi Iizuka, 刘身健, 倪图强, 张兴
Active Ion-Trajectory Control at the Wafer Extreme Edge in Plasma Etch
LI Guorong, ZHAO Kui, YAN Lijun, Hiroshi Iizuka, LIU Shenjian, Tom NI, ZHANG Xing
北京大学学报自然科学版
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2019, (6): 1002
-1006
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DOI: 10.13209/j.0479-8023.2019.066
