Abstract: Dense,crack-free and uniform nanocrystalline (Al₂O₃)_0.10(Sc₂O₃)_0.08(ZrO₂)_0.82 and (Sc₂O₃)_0.125(TiO₂)_0.175(ZrO₂)_0.70 thin films with thickness of 0.31μm and 0.36μm respectively on Si(100) substrate, have been successfully prepared by a Sol-Gel spin coating method. Cubic nanocrystals can be obtained at relatively low sintering temperature with an average grain size of about 47 nm and 51 nm respectively. The aluminia-doped ScSZ thins film are the same dense as the ScSZ thin films. However, there are a small amount of pinholes found in the microstructure of the titania-doped ScSZ films.

Key words: Aluminia or titania doped scandia stabilized zirconia, nanocrystalline thin film, Sol-Gel preparatio

摘要： 利用溶胶-凝胶旋涂法，在单晶硅基片(100)上分别制得了厚度约为0.31μm的(Al₂O₃)_0.10(Sc₂O₃)_0.08(ZrO2)_0.82和0.36μm的(Sc₂O₃)_0.125(TiO₂)_0.175(ZrO₂)_0.70固体电解质纳米晶薄膜。烧结实验结果表明，两种薄膜均在650℃以上开始晶化，温度越高，晶化越完全，在800℃可完全晶化；所得纳米晶颗粒呈纯的萤石结构立方相；铝和钛掺杂的纳米晶颗粒的平均大小分别为47和51nm。铝掺杂的薄膜非常均匀致密，然而，钛掺杂的薄膜存在少量微气孔。

关键词: 铝或钛掺杂的氧化钪稳定的氧化锆, 纳米晶薄膜, Sol-Gel制备, 表征